Laboratory of Plasma Physical Chemistry

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Publications in 2009
2016-02-12 17:21  
63 . Zhao, G. L.; Xu, Y.; Shang, J. P.; Zhu, A. M.; Lu, W. Q.; Wang, Y. N., Experimental Study of Spatial Non-Uniformities in a Dual Frequency Capacitively Coupled Plasma. Mod Phys Lett B 2009, 23 (28), 3409-3417.
62 . Yao, Z. W.; Zhu, A. M.; Au, C. T.; Shi, C. A., Redox Properties of Cobalt Nitrides for NO Dissociation and Reduction. Catal Lett 2009, 130 (1-2), 63-71.
61 . Yao, Z. W.; Shi, C., Development of a Catalytic Cycle in Molybdenum Carbide Catalyzed NO/CO Reaction. Catal Lett 2009, 130 (1-2), 239-245.
60 . Fan, H. Y.; Shi, C.; Li, X. S.; Zhao, D. Z.; Xu, Y.; Zhu, A. M., High-efficiency plasma catalytic removal of dilute benzene from air. J Phys D Appl Phys 2009, 42 (22), -.
59 . Fan, H. Y.; Shi, C.; Li, X. S.; Yang, X. F.; Xu, Y.; Zhu, A. M., Low-temperature NO (x) Selective Reduction by Hydrocarbons on H-Mordenite Catalysts in Dielectric Barrier Discharge Plasma. Plasma Chem Plasma P 2009, 29 (1), 43-53.
58 . Di, L. B.; Li, X. S.; Shi, C.; Xu, Y.; Zhao, D. Z.; Zhu, A. M., Atmospheric-pressure plasma CVD of TiO2 photocatalytic films using surface dielectric barrier discharge. J Phys D Appl Phys 2009, 42 (3), -.
57 . Cheng, X. Q.; Zhu, A. M.; Zhang, Y. Z.; Wang, Y.; Au, C. T.; Shi, C. A., A combined DRIFTS and MS study on reaction mechanism of NO reduction by CO over NiO/CeO2 catalyst. Appl Catal B-Environ 2009, 90 (3-4), 395-404.
56 . Chen, X. M.; Zhu, A. M.; Shi, C., The Nature of Active Sites of Co/Al2O3 for the Selective Catalytic Reduction of NO with C2H4. Catal Lett 2009, 133 (1-2), 134-141.
55 . Chen, X. M.; Yang, X. F.; Zhu, A. M.; Fan, H. Y.; Wang, X. K.; Xin, Q.; Zhou, X. R.; Shi, C., In situ DRIFTS study on the partial oxidation of ethylene over Co-ZSM-5 catalyst. Catal Commun 2009, 10 (5), 428-432.
54 . Chen, X. M.; Yang, X. F.; Zhu, A. M.; Au, C. T.; Shi, C. A., In situ DRIFTS study during C2H4-SCR of NO over Co-ZSM-5. J Mol Catal A-Chem 2009, 312 (1-2), 31-39.
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Laboratory of Plasma Physical Chemistry, Dalian University of Technology